ITO film deposition PVD batch equipment
Solving the film quality control of ITO films.
Our company offers a batch-type sputtering device (PVD) for ITO film deposition that can handle everything from research and development to small-scale production. This device enables the deposition of ITO thin films for optical semiconductor devices and electronic devices. The device is equipped with both DC and RF power supplies, allowing for the control of sputtering voltage during discharge, which results in low resistance (<200μΩ·cm) and high transmittance (>90%@400~700nm [ITO itself]) ITO thin films. Additionally, it supports film deposition from low to high temperatures (up to 350°C) and allows for control of crystallinity. It is suitable for deposition on semiconductor wafers and glass substrates, as well as on resin substrates such as PET and polycarbonate.
- Company：プラズマ・サーモ・ジャパン
- Price：Other
